| Hafnium(IV) silicate | |
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Hafnium(IV) silicate |
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Hafnium(4+) silicate |
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| Identifiers | |
| PubChem | 17979268 |
| ChemSpider | 16470992 |
| Jmol-3D images | Image 1 |
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| Properties | |
| Molecular formula | HfO4Si |
| Molar mass | 270.57 g mol−1 |
| Exact mass | 271.903133781 g mol-1 |
| Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa) | |
| Infobox references | |
Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4.
Thin films of hafnium silicate and zirconium silicate produced by chemical vapor deposition, most often MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in semiconductors.
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